SEMICOSIL® HMN-EL is Hexamethyldisilazane of high purity.
- high purity
- low metal content
- low chloride content
- low residue on evaporation
SEMICOSIL® HMN-EL was developed for photoresists used in the semiconductor manufacture. It can be used e.g. as adhesion promoter or as silylating agent in processes such as chemical amplification.