Electronic Chemicals for the Semiconductor Industry
High purity combined with extremely low metal contamination make SEMICOSIL® electronic silanes a key material for the semiconductor industry. As one of the world’s largest producers of silanes, WACKER boasts an innovative portfolio of additives for producing microelectronic components, raw materials for process optimization and precursors for depositing insulating layers in CVD chambers.
SEMICOSIL® TEOS tetraethyl orthosilicates and SEMICOSIL® dimethyldimethoxysilanes act as insulating layers in semiconductor components.
Benefits:
- High purity
- Low metal content
- Low chloride content
- Low methanol content
- Special grades with low dielectric constants for the new chip generation
Applications:
- Precursor in the generation of insulating layers by CVD
- Constituent of coatings produced by spin-on processes
SEMICOSIL® silazanes are used as additives for microelectronic applications and as raw materials for process optimization in the field of lithography.
Benefits:
- High purity
- Low metal content
- Low chloride content
- Low evaporation residue
Applications:
- Adhesion promoter in lithographic processes
- Raw material for modifying photoresist polymers
- Raw material for generating structures on insulating layers
- Fabrication of etch-stop layers
HDK® I13 is used as an abrasive component in slurries for chemical mechanical polishing (CMP).
Benefits:
- Low metal content
- Low variation of BET surface area
- Scratch prevention due to low coarse particle content
Applications:
- Components in CMP slurries
SEMICOSIL® HCl 5.5 is a hyperpure hydrogen chloride that meets the strictest quality requirements for semiconductor manufacturing.
Benefits:
- Hyperpure
- Consistent quality with respect to traces of foreign gases and metals
Applications:
- Cleaning and etching in semiconductor manufacturing
- Etching off deposits in epitaxial chambers to prevent particle release