SEMICOSIL® HMN-EL is Hexamethyldisilazane of high purity.
- high purity
- low metal content
- low chloride content
- low residue on evaporation
SEMICOSIL® HMN-EL was developed for photoresists used in the semiconductor manufacture. It can be used e.g. as adhesion promoter or as silylating agent in processes such as chemical amplification.
The 'Best use before end' date of each batch is shown on the product label. Storage beyond the date specified on the label does not necessarily mean that the product is no longer usable. In this case however, the properties required for the intended use must be checked for quality assurance reasons.