BELSIL® PF 200 is a phenyl-modified polydimethylsiloxane whose chemical structure has a large number of beneficial properties, such as a high refractive index, which imparts high shine and gloss, and good surface characteristics which ensure that hair stays pleasantly soft and supple even after being washed or styled.
The product also offers significant processing advantages: unlike conventional phenyl silicone fluids, which are not readily miscible with water, BELSIL® PF 200 is self-emulsifying in water due to its polarity. It dissolves in water-based formulations and produces a transparent microemulsion, which can be formulated easily. The silicone fluid is ideal for creating water-based products such as shampoos, conditioners and hair styling products. It can also be used for color cosmetics (lipsticks, lip gloss, facial foundations) as well as for skin care formulations, such as body lotions, body creams and sun care. BELSIL® PF 200 imparts high sheen and gloss in both oil and water based systems.
WACKER’s focus at in-cosmetics Brazil beyond BELSIL® PF 200 will include BELSIL® ADM 8301 E, a silicone emulsion specifically developed for hair treatments. In addition to lending hair a natural, silky softness, and making it easy to comb, the new emulsion also helps prevent hair from losing color and protects it from heat damage caused by blow dryers. BELSIL® ADM 8301 E is available as a microemulsion. The active silicone ingredients contained in this emulsion form a protective film on the surface of the hair. This product is suitable for rinse-off and leave-on hair-care formulations and for hair-styling products. BELSIL® ADM 8301 E is translucent, making it possible to formulate transparent products.
WACKER will be presenting BELSIL® PF 200 and BELSIL® ADM 8301 E at the in-cosmetics Innovation Seminar on October 1 at 4:15 p.m. (“BELSIL® Silicone Innovations,” Theater II). Earlier that day, at 2:00 p.m., WACKER will be presenting HTEssence®, a nature-identical hydroxytyrosol for skin-care products and other cosmetics.